تفاصيل الوثيقة
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نوع الوثيقة |
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مقال في مجلة دورية |
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عنوان الوثيقة |
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A study of optical properties of hydrogenated microcrystalline silicon films prepared by plasma enhanced chemical vapor deposition technique at different conditions of excited power and pressure A study of optical properties of hydrogenated microcrystalline silicon films prepared by plasma enhanced chemical vapor deposition technique at different conditions of excited power and pressure |
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الموضوع |
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فيزياء |
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لغة الوثيقة |
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الانجليزية |
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المستخلص |
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Two sets of hydrogenated microcrystalline silicon thin-film samples were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique at different deposition conditions of excited power and pressure. The correlation between the crystalline volume fraction for the samples determined from Raman spectra and the excited power, pressure, absorption coefficient, refractive index and optical energy gap was discussed. The values of optical parameters (refractive index and absorption coefficient), were calculated from the transmission spectra in the range 400-2500 nm. The optical band energy gap and Urbach energy were obtained using the calculated values of absorption coefficients. © 2009 Elsevier Ltd. All rights reserved. |
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ردمد |
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0042-207X |
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اسم الدورية |
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Vacuum |
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المجلد |
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83 |
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العدد |
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7 |
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سنة النشر |
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2009 هـ
2009 م |
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عدد الصفحات |
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7 |
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نوع المقالة |
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مقالة علمية |
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تاريخ الاضافة على الموقع |
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Tuesday, October 13, 2009 |
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الباحثون
| رشاد بدران | Badran, R.I. | باحث | دكتوراه | rbadran@hau.edu.sa |
| فرج الحازمي | Al-Hazmi, F.S. | باحث | دكتوراه | Falhazmi@kau.edu.sa |
| صالح الحنيطي | Al-Heniti, S. | باحث | دكتوراه | sheniti@kau.edu.sa |
| أحمد عبدالله الغامدي | Al-Ghamdi, A.A | باحث | دكتوراه | AGAMDI@kau.edu.sa |
| Li, J. | Li, J. | باحث | دكتوراه | |
| Xiong, S | Xiong, S | باحث | دكتوراه | |
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الرجوع إلى صفحة الأبحاث
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